| 摘要 |
The present invention relates to a method of recycling propyleneglycol monomethylether acetate (PMA) used in a photoresist process which comprises the following steps: a preparation step for preparing a waste organic solvent with PGEMA and impurities used in the photoresist process; a first reaction step for inserting a polymerization preventing agent into the waste organic solvent for reaction; a second reaction step for inserting an additive into the waste organic solvent for reaction; and a removal step for removing the impurities from the waste organic solvent by fractional distillation. The method enables users to purify the waste organic solvent and obtain high purity PMA. |
