发明名称 |
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation |
摘要 |
Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.; |
申请公布号 |
US2014220490(A1) |
申请公布日期 |
2014.08.07 |
申请号 |
US201414246561 |
申请日期 |
2014.04.07 |
申请人 |
Central Glass Company, Limited |
发明人 |
KOMORIYA Haruhiko;SUMIDA Shinichi;INOMIYA Kenjin;MORI Takashi;KITAMOTO Takamasa;KANTO Yusuke |
分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Ube-shi JP |