| 摘要 |
This infrared radiation reflecting film (100) is provided with, in order, an infrared radiation reflecting layer (20) having a metal layer (25) and metal oxide layers (21, 22), and a transparent protective layer (30) on a transparent film substrate (10). In this production method, the metal oxide layers are formed by DC sputtering using a winding sputtering apparatus. The sputtering target used in DC sputtering contains zinc atoms and tin atoms. The sputtering target is preferably obtained by sintering a metal powder, and at least one metal oxide among zinc oxide and tin oxide. |
