发明名称 Apparatus for manufacturing multi-layer mirror and multi-layer mirror using the same
摘要 PURPOSE: A manufacturing device for a multi-layer thin firm mirror and a grade mirror thereof are provided to narrow solid colors' full width at half maximum (FWHM) by making each thin film have a certain grade corresponding to the incidence angle of X-rays. CONSTITUTION: A multi-layer thin film mirror manufacturing device includes a substrate (10), a mask unit (20), an energy-generating unit (40), and a target (30). The substrate is fixed on a substrate supporting unit and target atoms are evaporated on the substrate. The mask unit is located at a certain interval from the substrate and a mask (25) through which the target atoms pass is formed. The target atoms are scattered by an energy source, which is radiated by the energy-generating unit. The mask unit is moved at a limited speed.
申请公布号 KR101425259(B1) 申请公布日期 2014.08.07
申请号 KR20110139468 申请日期 2011.12.21
申请人 发明人
分类号 H01J35/02 主分类号 H01J35/02
代理机构 代理人
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