发明名称 |
SEMICONDUCTOR DEVICE WITH ENHANCED 3D REDUCED SURFACE FIELD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device with an enhanced 3D RESURF effect.SOLUTION: A device includes a semiconductor substrate, and source and drain regions in the semiconductor substrate are separated from one another along a first lateral direction. Charge carriers drift through a drift region in the semiconductor substrate during operation upon application of a bias voltage between the source and drain regions. The drift region has a dopant profile with a notched portion in a second lateral direction along an interface between the drift region and the drain region. |
申请公布号 |
JP2014143419(A) |
申请公布日期 |
2014.08.07 |
申请号 |
JP20140009652 |
申请日期 |
2014.01.22 |
申请人 |
FREESCALE SEMICONDUCTOR INC |
发明人 |
YANG HONGNING;LIN XIN;ZHANG ZHIHONG;JIANG-KAI ZUO |
分类号 |
H01L21/336;H01L29/06;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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