发明名称 SEMICONDUCTOR DEVICE WITH ENHANCED 3D REDUCED SURFACE FIELD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device with an enhanced 3D RESURF effect.SOLUTION: A device includes a semiconductor substrate, and source and drain regions in the semiconductor substrate are separated from one another along a first lateral direction. Charge carriers drift through a drift region in the semiconductor substrate during operation upon application of a bias voltage between the source and drain regions. The drift region has a dopant profile with a notched portion in a second lateral direction along an interface between the drift region and the drain region.
申请公布号 JP2014143419(A) 申请公布日期 2014.08.07
申请号 JP20140009652 申请日期 2014.01.22
申请人 FREESCALE SEMICONDUCTOR INC 发明人 YANG HONGNING;LIN XIN;ZHANG ZHIHONG;JIANG-KAI ZUO
分类号 H01L21/336;H01L29/06;H01L29/78 主分类号 H01L21/336
代理机构 代理人
主权项
地址