发明名称 |
SYSTEMS AND METHODS FOR SUB-APERTURE BASED ABERRATION MEASUREMENT AND CORRECTION IN INTERFEROMETRIC IMAGING |
摘要 |
Systems and methods for sub-aperture correlation based wavefront measurement in a thick sample and correction as a post processing technique for interferometric imaging to achieve near diffraction limited resolution are described. Theory, simulation and experimental results are presented for the case of full field interference microscopy. The inventive technique can be applied to any coherent interferometric imaging technique and does not require knowledge of any system parameters. In one embodiment of the present application, a fast and simple way to correct for defocus aberration is described. A variety of applications for the method are presented. |
申请公布号 |
WO2014118325(A1) |
申请公布日期 |
2014.08.07 |
申请号 |
WO2014EP51918 |
申请日期 |
2014.01.31 |
申请人 |
CARL ZEISS MEDITEC AG |
发明人 |
KUMAR, ABHISHEK;TUMLINSON, ALEXANDRE R;LEITGEB, RAINER |
分类号 |
G03H1/08;A61B3/10;G01B9/02;G01B11/00;G01N21/47;G03H1/04 |
主分类号 |
G03H1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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