发明名称 |
RESIN HAVING FLUORENE STRUCTURE AND UNDERLAYER FILM-FORMING MATERIAL FOR LITHOGRAPHY |
摘要 |
There are provided a novel resin having a fluorene structure which has a relatively high carbon concentration in the resin, which has a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process, and a method for producing the resin, as well as a material for forming an underlayer film useful for forming a novel resist underlayer film excellent in heat resistance and etching resistance as an underlayer film for multilayer resist, and a pattern forming method using the material. The resin of the present invention has a structure represented by the following general formula (1).
(in the general formula (1), each of R 3 and R 4 independently denotes a benzene ring or a naphthalene ring, a carbon atom at the bridgehead of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom of each of other aromatic rings, and a carbon atom of each of aromatic rings of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom at the bridgehead of other fluorene backbone or (di)benzofluorene backbone.) |
申请公布号 |
EP2762513(A1) |
申请公布日期 |
2014.08.06 |
申请号 |
EP20120835660 |
申请日期 |
2012.09.04 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
HIGASHIHARA, GO;UCHIYAMA, NAOYA;ECHIGO, MASATOSHI |
分类号 |
C08G61/02;C08L65/00;G03F7/11;H01L21/027 |
主分类号 |
C08G61/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|