发明名称 POLISHING DEVICE
摘要 <p>The invention describes a polishing device (100) for polishing a component (200), comprising an elongated polishing element (110), which is directed against the surface (205) of the component (200) parallel to the longitudinal axis (z) of the component (200). In this case, the polishing element (110) is formed in adjustment subsegments (110-1, 110-2, . . . 110-n) in its longitudinal extent. A housing (120) serves for receiving the polishing element (110). Arranged between a bearing surface (123 of the housing (120) and the polishing element (110) is a pressure-exerting element (130), for placing and pressing the polishing element (110) against the component (200). In this case, the pressure-exerting element (130) is formed as at least one flexible tube to which pressure can be applied.</p>
申请公布号 EP2588272(B1) 申请公布日期 2014.08.06
申请号 EP20110727996 申请日期 2011.06.29
申请人 SMS SIEMAG AG 发明人 CRAMER, ULRICH;HOLZHAUER, THOMAS
分类号 B24B5/00;B21B28/02;B21B28/04;B24B5/35;B24B5/37;B24B33/04;B24B33/08;B24B33/10 主分类号 B24B5/00
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