Polymerizable ester compound, polymer, resist composition, and patterning process

摘要

Polymerizable ester compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.;

主权项

1. A polymerizable ester compound having the general formula (2):wherein Rl is hydrogen, fluorine, methyl or trifluoromethyl, R3 is hydrogen or a C1-C15 straight, branched or cyclic, monovalent hydrocarbon group, and R4 is a C1-C15 straight, branched or cyclic, monovalent hydrocarbon group in which a constituent —CH2— may be substituted by —O— or —C(═O)—.