发明名称 |
PROJECTION SYSTEM, MIRROR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS |
摘要 |
Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror. |
申请公布号 |
WO2014114405(A2) |
申请公布日期 |
2014.07.31 |
申请号 |
WO2013EP76310 |
申请日期 |
2013.12.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DE KERKHOF, MARCUS;VAN OOSTEN, ANTON;BUTLER, HANS;LOOPSTRA, ERIK;VAN DER WIJST, MARC;ZAAL, KOEN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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