发明名称 A lithography apparatrus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
摘要 An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
申请公布号 IL232805(D0) 申请公布日期 2014.07.31
申请号 IL20140232805 申请日期 2014.05.26
申请人 ASML NETHERLANDS B.V. 发明人
分类号 G03F 主分类号 G03F
代理机构 代理人
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