| 摘要 |
An illumination system for lithography, comprising: a laser light source (1), and a collimation and beam expanding unit (2), a pupil shaping unit (3), a first micro-lens array (4), a calculus rod array (11), a micro-scanning slit array (7), a second micro-lens array (5), a collecting lens group (6) and a mask (9) which are arranged in sequence in the laser advancing direction of the laser light source (1).The motion of the micro-scanning slit array (7) is controlled by a motion control unit (10).This illumination system for lithography reduces the scanning stroke and speed of scanning slits, reduces the influence of scanning slit vibration, improves the transmittance of the system, and has the characteristic of a simple structure. |
