发明名称 BIPOLAR/DUAL FET STRUCTURE INCLUDING ENHANCEMENT AND DEPLETION MODE FETS WITH ISOLATED CHANNELS FET / FET
摘要 Bipolar field effect transistor (BiFET) structures and methods of forming the same are provided. In one embodiment, an apparatus includes a substrate and a plurality of epitaxial layers disposed over the substrate. The plurality of epitaxial layers includes a first epitaxial layer, a second epitaxial layer disposed over the first epitaxial layer, and a third epitaxial layer disposed over the second epitaxial layer. The first epitaxial layer includes at least a portion of a channel of a first field effect transistor (FET) and the third epitaxial layer includes at least a portion of a channel of a second FET.
申请公布号 HK1163934(A1) 申请公布日期 2014.07.25
申请号 HK20120104223 申请日期 2012.04.30
申请人 SKYWORKS SOLUTIONS INC. 发明人 ZAMPARDI, PETER, J.;SUN, MIKE
分类号 H01L 主分类号 H01L
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