PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus of which the fluctuation in the plasma processing performance caused by physical fluctuation of a plasma processing chamber can be suppressed.SOLUTION: The plasma processing apparatus includes: a plasma processing chamber for processing a sample by plasma; a first high-frequency power source supplying a high-frequency power for generating plasma in the plasma processing chamber; a sample table for placing the sample; a second high-frequency power source supplying a high-frequency power to the sample table; detection means detecting a voltage and a current applied to the sample table; and a control device controlling the first and second high-frequency power supplies by using an output value from the detection means. The control device controls the first high-frequency power source by using data of a current waveform detected by the detection means, and controls the second high-frequency power source by using data of a voltage waveform detected by the detection means.