| 发明名称 |
VERTICAL DIFFUSION FURNACE |
| 摘要 |
A diffusion furnace includes a boat which supports a semiconductor wafer thereon and is rotatable together with the semiconductor wafer. A heater is arranged on the periphery of a core tube which houses the boat therein. The core tube includes a reaction gas supply pipe through which a reaction gas containing a dopant is supplied; and a cooling gas supply pipe through which a cooling gas is supplied toward an outer peripheral portion of the semiconductor wafer. |
| 申请公布号 |
US2014202387(A1) |
申请公布日期 |
2014.07.24 |
| 申请号 |
US201314016373 |
申请日期 |
2013.09.03 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
NISHIO Yoshifumi;NAKAO Takashi;ITANI Takaharu;TAKAMI Akihiro |
| 分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A diffusion furnace, comprising:
a rotatable boat which supports a semiconductor wafer thereon; a core tube which houses the rotatable boat therein; a heater which heats the semiconductor wafer in the core tube; a reaction gas supply pipe through which a reaction gas is supplied into the core tube; and a cooling gas supply pipe through which a cooling gas is supplied to the semiconductor wafer. |
| 地址 |
Tokyo JP |
