| 摘要 |
<p>The present invention relates to an air exhauster system of a wafer processing apparatus, and a main object of the present invention is to prevent secondary contamination of a wafer such that a process gas floating in a wafer processing apparatus and foreign substances such as fumes do not contact a wafer in a storage. The air exhauster system of a wafer processing apparatus according to the present invention includes a washing apparatus for removing a process gas residing in a wafer provided for a semiconductor manufacturing process module or foreign substances such as fumes, and includes air supply opening provided below the wafer processing apparatus formed in a vertical direction of a circulation unit having a circular recess on an inner sectional side of a positioning section having a circular recess shape such that an outer lower side of a first body having an introduction opening is inserted into the center thereof so that air containing foreign substances ejected by a purge unit can be introduced through the air supply opening; an air discharge opening in which a sectional upper end thereof is formed at a position lower than an upper surface of the positioning section to be spaced apart from a lower side of the first body by a predetermined distance; and a second body including a diffuser unit an inner diameter in section is expanded such that air discharged through the air discharge opening can be diffused. Therefore, according to the present invention, secondary contamination of a wafer can be prevented by preventing a process chamber floating in a wafer processing apparatus and foreign substances such as fumes from contacting a wafer in a side storage.</p> |
