Ultra high precision measurement tool

摘要

A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission center of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.

主权项

1. Focused ion beam system at least adapted for one of CD-measurements or DR-measurements of a specimen, comprising:
a gas field ion source, the gas field ion source having an emitter tip; the emitter tip having a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip for emitting an ion beam; wherein the base tip is a single crystal base tip; a detector for detection of at least one of the group consisting of backscattered and secondary particles released from the specimen; an analyzer for performing at least one of the group consisting of analyzing, evaluating, and classifying structures on the specimen and being connected to the detector; and a probe current control device comprising a current measurement device and having a control loop adapted to trigger a probe current control action.