发明名称 |
SEMICONDUCTOR DEVICE WITH CHIP HAVING LOW-K-LAYERS |
摘要 |
A semiconductor device is described having at least one semiconductor chip, the chip having an active area on a top side thereof, the active area formed at least in part of low-k material, said low-k material defining a low-k subarea of said active area; an embedding material, in which said at least one semiconductor chip is embedded, at least part of the embedding material forming a coplanar area with said active area; at least one contact area within the low-k subarea; a redistribution layer on the coplanar area, the redistribution layer connected to said contact areas; at least one first-level interconnect, located outside said low-k subarea, the first-level interconnect electrically connected to at least one of said contact areas via the redistribution layer. |
申请公布号 |
US2014197530(A1) |
申请公布日期 |
2014.07.17 |
申请号 |
US201313739045 |
申请日期 |
2013.01.11 |
申请人 |
Meyer Thorsten;Albers Sven;Geissler Christian;Wolter Andreas;Brunnbauer Markus;O'Sullivan David;Zudock Frank;Proschwitz Jan |
发明人 |
Meyer Thorsten;Albers Sven;Geissler Christian;Wolter Andreas;Brunnbauer Markus;O'Sullivan David;Zudock Frank;Proschwitz Jan |
分类号 |
H01L23/29;H01L21/56 |
主分类号 |
H01L23/29 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
at least one semiconductor chip, the chip comprising: an active area on a top side of the at least one semiconductor chip, the active area being formed at least in part of a low-k material defining a low-k sub-area of the active area; an embedding material embedding the at least one semiconductor chip, wherein at least part of the embedding material forms a coplanar area with the active area; at least one contact area disposed within the low-k sub-area; and at least one interconnect, located outside the low-k sub-area, the interconnect electrically connected to the at least one contact area. |
地址 |
Regensburg DE |