| 摘要 |
<p>The present invention provides an array substrate and a method of fabricating the same. The array substrate includes a first buffer layer made of an inorganic insulation material on the entire surface of a substrate in which a pixel region including a device region is defined; a second buffer layer formed on the first buffer layer out of metal oxide representing insulation characteristics; an oxide semiconductor layer formed on the second buffer layer and including an active region in one island form and a conductive source region and a conductive drain region formed at both sides of the active region; a gate insulation layer and a gate electrode sequentially laminated on the oxide semiconductor layer corresponding to the active region; an interlayer insulation layer formed on the entire surface of the gate electrode and having semiconductor layer contact holes exposing the source region and the drain region, respectively; and a source electrode and a drain electrode making contact with the source region and the drain region of the oxide semiconductor layer, respectively, through the semiconductor layer contact holes over the interlayer insulation layer while being spaced apart from each other.</p> |
