| 摘要 |
<p>PURPOSE: A chemical vapor deposition apparatus for a flat panel display is provided to intactly align a susceptor from outside a chamber, thereby improving a yield rate. CONSTITUTION: A chemical vapor deposition apparatus for a flat panel display includes chambers (10,20), a susceptor (50), and an align unit (70) for the susceptor. In the chambers, a deposition process is implemented on the display. The display is loaded on the susceptor inside the chambers. One end of the align unit inside the chambers are adjacent to the susceptor, and the other end of the align unit is placed outside the chambers. The align unit aligns the susceptor from outside the chambers.</p> |
