| 摘要 |
<p>The present description relates to a high speed gas exchanging apparatus for reducing processing time. A gas supplying part is formed at one side of a chamber. A gas discharging part is formed at the other side of the chamber. A plurality of gas supplying valves of the gas supplying part or a plurality of gas discharging valves of the gas discharging part are opened or closed sequentially so that air in the chamber can be exchanged with desired gas while pressure inside the chamber is maintained to be constant. Therefore, the high speed gas exchanging apparatus can exchange air with the gas quickly and stably when exchanging air in a sealed container such as a chamber for manufacturing a semiconductor or an OLED or a glove box for experiments, with the desired gas in order to make an atmosphere of the desired gas, can increase the productivity of semiconductor products; and can reduce time for experiments.</p> |
