METHOD OF MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate with a multilayer reflection film in which in-plane variation of the center wavelength of exposure light of a multilayer reflection film can be suppressed.SOLUTION: A multilayer reflection film is formed by laminating about 40 periods of the deposition of a low refractive index layer (e.g., silicon layer) and a high refractive index layer (e.g., molybdenum layer) in this order on a substrate, while rotating the substrate about the central axis thereof. Deposition conditions are set while assuming the variation with time in each deposition rate of the low refractive index layer and high refractive index layer, so that the in-plane variation of the center wavelength of exposure light of the multilayer reflection film is 0.04 nm or less, by suppressing the in-plane film thickness distribution of the multilayer reflection film due to deviation of azimuth of substrate rotation at the start and end of deposition of the low refractive index layer and high refractive index layer.