| 摘要 |
<p>The present invention provides a load lock chamber which is provided to reduce kinetic energy of gas injected inside a substrate storage space, thereby minimizing particles which are scattered by the injected gas. The kinetic energy of gas is reduced by a method of providing a space to expand a pipe of a gas injecting line to form air atmosphere inside a substrate storage space; by a method of dividing a part of the sections of the gas injection line into unit spaces communicated with each other; and by a method of filling a part of the sections of the gas injection lines with a porous material having air passing therethrough.</p> |
