| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving discharge of slurry and improving flatness of a polished object. <P>SOLUTION: The polishing pad 10 is provided with an urethane sheet 2, and the urethane sheet 2 has a polishing surface P for polishing by rotating relatively to the polishing object. A plurality of grooves 4 are formed from a center section to an outer edge on a polishing surface P side of the urethane sheet. The grooves 4 are formed behind a tangent at a starting point of the grooves 4 against a rotating direction of the polished surface P. The groove 4 is formed such that the cross section of the groove 4 in a direction crossing with the tangential direction at an arbitrary point is enlarged at an outer edge side rather than a center side. The slurry can move through the groove 4 at the time of polishing without opposing centrifugal force and inertia. <P>COPYRIGHT: (C)2011,JPO&INPIT |
