| 发明名称 |
Method for preparing a diorganodihalosilane |
| 摘要 |
A method of preparing a diorganodihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst is selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, calcium, cesium, tin, and sulfur; and (ii) contacting the silicon-containing copper catalyst with an organohalide at a temperature of from 100 to 600° C. to form at least one diorganodihalosilane. |
| 申请公布号 |
US8772525(B2) |
申请公布日期 |
2014.07.08 |
| 申请号 |
US201113639518 |
申请日期 |
2011.03.31 |
| 申请人 |
Dow Corning Corporation |
发明人 |
Katsoulis Dimitris;Larsen Robert |
| 分类号 |
C07F7/18 |
主分类号 |
C07F7/18 |
| 代理机构 |
|
代理人 |
Fewkes Matthew T.;Brown Catherine U. |
| 主权项 |
1. A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps:
(i) contacting a copper catalyst with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising from 1 to 5% (w/w) of silicon, wherein the copper catalyst is selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, calcium, cesium, tin, and sulfur; and (ii) contacting the silicon-containing copper catalyst with an organohalide at a temperature of from 100 to 600° C. to form at least one diorganodihalosilane. |
| 地址 |
Midland MI US |
