| 摘要 |
PURPOSE:To sharply and precisely form a fine pattern with superior efficiency at a low cost by forming a nonviscous transfer pattern via a masking layer on a substrate, and then transferring this pattern to a work by means of pressing via an adhesive layer. CONSTITUTION:A masking layer 2 of the prescribed shape is formed on a substrate 1. This masking layer 2 can be obtained by vacuum-depositing a thin film of SiO2, etc., and exerting etching treatment via a photoresist. Subsequently, a nonviscous transfer pattern 3 is formed by an electrodeposition method on the part, where the above masking layer is not formed, of the above substrate 1 to provide a transfer substrate 4. Then, an adhesive layer 5 of rubber type, etc., is formed at least on the above transfer pattern 3. At this time, the total film thickness (d) of the nonviscous transfer pattern 3 and the adhesive layer 5 is regulated so that it is maximum among the thicknesses of the films on the above substrate 1. Subsequently, the transfer substrate 4 and a work 6 are disposed in a manner to be opposed to each other via a matching gap (g) to perform alignment, and the above adhesive layer 5 is allowed to adhere to the work 6. By this method, the above transfer pattern 3 can be transferred to the work via the adhesive layer 5, and the fine pattern can be formed. |
