发明名称 Method for producing liquid crystal panel, liquid crystal panel, and repair apparatus
摘要 Provided is a method for producing a liquid crystal panel capable of repairing a defective portion of an alignment film more easily. Provided is a method for producing a liquid crystal panel, including the step of repairing a defective portion 50 of an alignment film 30 formed on a substrate 12 by use of a repair stamp 60 having repair ink 61 attached thereto. The step of repairing includes step (a) of locating the repair stamp 60 in a zone (repair zone) 55 including the defective portion 50; step (b) of moving the repair stamp 60 from the position (60a) at which the repair stamp 60 has been located in step (a); and step (c) of moving the repair stamp 60 again from a position (60b) to which the repair stamp 60 has been moved in step (b) to the position (60a) at which the repair stamp 60 was located in step (a).
申请公布号 US8773634(B2) 申请公布日期 2014.07.08
申请号 US201013376123 申请日期 2010.04.28
申请人 Sharp Kabushiki Kaisha 发明人 Satoh Hitoshi
分类号 G02F1/1337 主分类号 G02F1/1337
代理机构 Morrison & Foerster LLP 代理人 Morrison & Foerster LLP
主权项 1. A method for producing a liquid crystal panel, comprising the steps of: preparing a substrate having an alignment film formed thereon; and repairing a defective portion of the alignment film by use of a repair stamp having repair ink attached thereto; wherein the step of repairing includes, step (a) of locating the repair stamp on a position in a zone of the substrate, including the defective portion,step (b) of moving the repair stamp, while keeping the repair stamp in contact with the zone of the substrate, from the position on which the repair stamp has been located in step (a) to another position of the zone of the substrate, andstep (c) of moving the repair stamp again, while keeping the repair stamp in contact with the zone of the substrate, from the another position to which the repair stamp has been moved in step (b) to the position on which the repair stamp was located in step (a).
地址 Osaka-shi, Osaka JP