THERMAL TREATMENT DEVICE FOR SUBSTRATE

摘要

The present invention relates to a heat treatment device for substrate which simultaneously performs a thermal process on multiple substrates and facilitates maintenance. The present invention, in a heat treatment device for substrate which includes a heating chamber which performs a thermal process on multiple substrates, provides a heat treatment device for a substrate which includes a heating chamber which includes a chamber outer wall of an outer wall, a front door which is formed in one side of the chamber outer wall and opens/closes to load and unload the substrate, and a heating module which can be drawn from the inner part of the heating chamber to the outer part of the heating chamber and supports and heats the substrate.