METHOD FOR MANUFACTURING PIEZOELECTRIC OSCILLATION PIECE, PIEZOELECTRIC OSCILLATION PIECE, PIEZOELECTRIC OSCILLATOR, OSCILLATOR, ELECTRONIC EQUIPMENT AND ELECTRIC WAVE CLOCK

摘要

PROBLEM TO BE SOLVED: To make an etching residue uniform.SOLUTION: Prior to forming a pair of first and second end faces SA, SB in a width direction of an oscillation arm of a piezoelectric oscillation piece by an etching process, an outline auxiliary pattern 41B comprising an outline photoresist film 41 is disposed only in a first regionαof two regions of the first regionαand a second regionβ: the first regionαextending from an end 41Aa of an outline pattern 41A comprising the outline photoresist film 41 for forming the first end face SA having a large etching rate, to a predetermined distance L1 along the normal direction of the first end face SA; and the second regionβextending from an end 41Ab of the outline pattern 41A of the outline photoresist film 41 for forming the second end face SB having a small etching rate, to the predetermined distance L1 along the normal direction of the second end face SB. The position and size of the outline auxiliary pattern 41B are set to give substantially the same etching rate in the first regionαand the second regionβ.