发明名称
摘要 A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements (33a-33e) and associated optical components (16) of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
申请公布号 JP5537455(B2) 申请公布日期 2014.07.02
申请号 JP20110014525 申请日期 2011.01.26
申请人 发明人
分类号 H01L21/027;G02B19/00;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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