发明名称 METHOD OF ELECTROLESS INTRODUCTION OF INTERCONNECT STRUCTURES
摘要 <p>An apparatus including a substrate comprising a device having contact point; a dielectric layer overlying the device with an opening to the contact point; and an interconnect structure disposed in the opening including an interconnect material and a different conductive shunt material.</p>
申请公布号 EP1346408(B1) 申请公布日期 2014.07.02
申请号 EP20010993180 申请日期 2001.11.15
申请人 INTEL CORPORATION 发明人 MCGREGOR, PAUL, J.;THOMAS, CHRISTOPHER;DATTA, MADHAV;DUBIN, VALERY
分类号 H01L21/768;H01L21/288;H01L23/532 主分类号 H01L21/768
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