发明名称 SUBSTRATE HOLDER AND PRODUCTION METHOD FOR SUBSTRATE HAVING FILM FORMED OVER ENTIRE SURFACE THEREOF USING SAME
摘要 <p>Provided are a substrate holder that improves the production characteristics of a substrate having a film formed over the entire surface thereof and a production method for a substrate having a film formed over the entire surface thereof that uses the substrate holder. The substrate holder holds a substrate that comprises a first main surface having a film formed over the entire surface thereof and comprises: a holder unit that is configured from a unit base that is a plate-shaped member comprising a main surface that has a smaller area than the main surface of the substrate, and an adhesion layer that is fixed to a second main surface of the unit base and that comprises a peelable surface that adheres to the second main surface of the substrate; and a carrier that comprises a unit fixing surface having an area that is larger than the area of the main surface of the unit base and that has a plurality of the holder units attached to the unit fixing surface such that the unit fixing surface and the second main surface of the unit base face each other. Also provided is a production method for a substrate having a film formed over the entire surface thereof that uses the substrate holder.</p>
申请公布号 WO2014098200(A1) 申请公布日期 2014.06.26
申请号 WO2013JP84152 申请日期 2013.12.19
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 MIYAZAWA, HIDEAKI;AKAO, YASUHIKO;FUJII, KENSUKE;TAKAKI, SATORU;FUJIWARA, TERUO
分类号 C23C14/50;C23C14/34;H01L21/673 主分类号 C23C14/50
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