RESIST COMPOSITION AND MANUFACTURING METHOD OF RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition which allows a negative resist pattern to be manufactured with an excellent focus margin.SOLUTION: The resist composition contains: a resin which includes a structural unit represented by a formula (I) and a structural unit represented by a formula (a4) and has no acid-unstable group; a resin which includes a structural unit represented by a formula (II) and a structural unit having an acid-unstable group; and an acid generator.