发明名称 Semiconductor Device and Manufacturing Method Thereof
摘要 A p channel TFT of a driving circuit has a single drain structure and its n channel TFT, a GOLD structure or an LDD structure. A pixel TFT has the LDD structure. A pixel electrode disposed in a pixel portion is connected to the pixel TFT through a hole bored in at least a protective insulation film formed of an inorganic insulating material and formed above a gate electrode of the pixel TFT, and in an interlayer insulating film disposed on the insulation film in close contact therewith. These process steps use 6 to 8 photo-masks.
申请公布号 US2014175444(A1) 申请公布日期 2014.06.26
申请号 US201414193597 申请日期 2014.02.28
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Yamazaki Shunpei;Arai Yasuyuki;Koyama Jun
分类号 H01L27/12 主分类号 H01L27/12
代理机构 代理人
主权项 1. (canceled)
地址 Kanagawa-ken JP