| 摘要 |
<p>An apparatus and method for removing contaminants from a gas stream is provided which includes (a) introducing the gas stream into a reaction chamber of a scrubber; (b) oxidizing first contaminants in a liquid phase with a reactive species in a sump of the scrubber for providing an oxidizing solution; (c) oxidizing second contaminants in a gas phase of the gas stream above the sump; (d) oxidizing and scrubbing third contaminants in a gas-liquid contact assembly disposed above the gas stream.</p> |
