| 摘要 |
The invention provides a copper etching solution capable of maintaining top shapes of patterns and etching at the same time even being used continuously or repeatedly, and a method for forming conductor patterns by using the etching solution. The etching solution is characterized in that the copper etching solution contains a copper ion source, acid and water, azole and an aromatic compound, wherein the azole only has a nitrogen atom as a hetero atom existed in a ring, and the aromatic compound is at least one selected from phenols and aromatic amines. In addition, the method for forming the conductor patterns is characterized by comprising the step of using the etching solution to etch the part of a copper layer not covered by etchant (3), so as to form the conductor patterns (2). |
