METHOD OF FABRICATING SEMICONDUCTOR DEVICES HAVING VERTICAL CELLS

摘要

The present invention relates to a method for fabricating a semiconductor device having a vertical cell. The method for fabricating a semiconductor device having a vertical cell according to one embodiment of the present invention includes a step of preparing a substrate; a step of forming a preliminary stack structure; a step of removing an upper preliminary stack structure; a step of forming a mask; a step of forming a first pattern; a step of forming a second pattern; and a step of forming a sacrificial preliminary stack structure.