| 摘要 |
An etchant composition of a single thin film, and a method for forming a metal pattern by using the composition are provided to reduce the side etching, to prevent the damage of underlayer and the generation of residue and to improve the uniformity of etching. An etchant composition of a single layer of silver or silver alloy and a multilayered film comprising the single layer and an indium oxide film, comprises a Fe^3+ salt compound 1 ~ 15 weight%; nitric acid 1 ~ 10 weight%; acetic acid 1 ~ 30 weight%; sodium phosphate monobasic 0.1 ~ 5 weight%; and water 40 ~ 96.9 weight%. |
