Microcrystalline silicon thin film PECVD using hydrogen and silanes mixtures

摘要

This invention describes the improvement of silicon thin film deposition, more specifically the capability to deposit microcrystalline silicon thin film which properties are suitable for a photovoltaic application in a tandem structure at increased deposition rate. This deposition is carried out under "soft" deposition conditions which are finely tuned, including mixtures of hydrogen and silanes.