发明名称 |
Method for producing optical orientation film, method for producing retardation film, system for producing optical orientation film, optical orientation film and retardation film |
摘要 |
A method for producing an optical orientation film is disclosed, the method being able to realize highly accurate exposure in a pattern, even if a simple device and non-parallel light are used and a long continuous resin substrate is used and fed continuously. The method for producing the optical orientation film includes the steps of: (i) preparing an irradiation target substrate and a long continuous photomask (ii) feeding the irradiation target substrate continuously; (iii) feeding the photomask continuously; (iv) producing a laminate by laminating the photomask fed in step (iii) on an orientation layer of the irradiation target substrate fed in step (ii); (v) exposing the orientation layer in the pattern by irradiating with light, while feeding the laminate obtained in step (iv) in the longitudinal direction of the laminate; and (vi) removing the photomask from the laminate irradiated in step (v). |
申请公布号 |
US8748084(B2) |
申请公布日期 |
2014.06.10 |
申请号 |
US201113173399 |
申请日期 |
2011.06.30 |
申请人 |
Dai Nippon Printing Co., Ltd. |
发明人 |
Fukuda Masanori |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for producing an optical orientation film, comprising the steps of:
(i) preparing an irradiation target substrate and a continuous photomask, the irradiation target substrate comprising a first continuous transparent-resin substrate and an orientation layer on one surface of the first continuous transparent resin substrate, and the continuous photomask comprising a second continuous transparent resin substrate and a desired ultraviolet shielding pattern on one surface of the second continuous transparent resin substrate; (ii) feeding the irradiation target substrate continuously; (iii) feeding the photomask continuously; (iv) producing a laminate by laminating the photomask fed in step (iii) on the orientation layer of the irradiation target substrate fed in step (ii); (v) exposing the orientation layer in the pattern by irradiating the orientation layer with first linearly polarized light in a constant polarization direction through the photomask, while feeding the laminate obtained in step (iv) in the longitudinal direction of the laminate; and (vi) removing the photomask from the laminate irradiated with the linearly polarized light in step (v).
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地址 |
Tokyo-to JP |