发明名称 Silica having metal ions absorbed thereon and fabricating method thereof
摘要 A silica having metal ions absorbed thereon and a fabricating method thereof are provided. The silica having metal ions absorbed thereon is a silica having metal ions absorbed thereon and being modified with persulfate salt. The method includes following steps. A solution is provided, and the solution includes silica and persulfate salt therein. The solution is heated to react the silica with the persulfate salt, so as to obtain silica modified with persulfate salt. Metal ion source is added in the solution, the metal ion source dissociates metal ions, and the silica modified with persulfate salt absorbs the metal ions to obtain the silica having metal ions absorbed thereon.
申请公布号 US8747693(B2) 申请公布日期 2014.06.10
申请号 US201213615539 申请日期 2012.09.13
申请人 UWIZ Technology Co., Ltd. 发明人 Ho Yun-Lung;Chang Song-Yuan;Lu Ming-Hui;Chiang Chung-Wei
分类号 C09K13/00;C01B33/20 主分类号 C09K13/00
代理机构 代理人
主权项 1. A fabricating method of silica having metal ions absorbed thereon, comprising: providing a solution, the solution comprising silica and persulfate salt therein; heating the solution to react the silica with the persulfate salt, so as to obtain silica modified with persulfate salt; and adding metal ion source in the solution, wherein the metal ion source dissociates metal ions, and the silica modified with persulfate salt absorbs the metal ions, so as to obtain the silica having metal ions absorbed thereon.
地址 Taoyuan County TW