Thin film production apparatus and inner block for thin film production apparatus

摘要

Provided is a thin film production apparatus that enables cost reduction and improvement of deposition efficiency by employing a common component. In a thin film production apparatus according to the present invention, a volume of a reaction space is optimized by determining the volume of the reaction space with an inner block disposed inside a vacuum tank, that is, by merely altering a size of an inner diameter of the inner block without altering a size of the vacuum tank. Accordingly, film formation on plural kinds of substrates having different sizes becomes possible using the common vacuum tank. Further, increase of the number of apparatus structural components to be prepared for each size of the substrate to be processed can be minimized, whereby the cost of the components can be reduced, and, while simplifying assembling operation, product inspection operation, and adjusting operation, excellent deposition efficiency and stable film formation can be realized.

主权项

1. A deposition apparatus comprising:
a vacuum tank: a lid body closing an upper portion of the vacuum tank; a stage for supporting a substrate to be processed; a gas head mounted to the lid body such that the gas head is opposed to the stage; and an inner block disposed between the vacuum tank and the lid body and including a built-in heating source, the inner block determining a volume of a reaction space between the stage and the gas head, wherein the inner block includes a plurality of annular block bodies each having a different inner diameter, wherein a first body of the plurality of annular block bodies mates against the vacuum tank, a second body of the plurality of annular block bodies includes a flange that bears on the first body, and a third body of the plurality of annular block bodies includes a flange that bears on the second body, and wherein the annular bodies are attached and detached to vary the volume of the reaction space.