DEPOSITION METHOD, PROGRAM FOR THE DEPOSITION METHOD, RECORDING MEDIUM STORING THE PROGRAM, DEPOSITION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a deposition method and a deposition device, capable of improving controllability and uniformity of deposition between a plurality of substrates and in a surface of a substrate.SOLUTION: A deposition device comprises: a first gas supply unit arranged in a first processing region above a rotary table; a second gas supply unit arranged in a second processing region separated from the first processing region; a separation gas supply unit provided between the first processing region and the second processing region; and a separation region in which a narrow space is formed which guides the separation gas supplied from the separation gas supply unit to the first processing region and the second processing region. A deposition method includes: a first reaction step of rotating the rotary table to a first angle; a second reaction step of rotating the rotary table to a second angle; a third reaction step of rotating the rotary table to a third angle; and a fourth reaction step of rotating the rotary table to a fourth angle. The sum of the first angle, the second angle, the third angle, and the fourth angle is not an integral multiple of 360 degrees.