发明名称 METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER
摘要 The present invention is a light homogenizer or light tunnel with highly reflective sides that enable the focusing of EUV illumination. The sides of the homogenizer are cut from a highly polished silicon wafer. The wafer is coated with a reflective coating before the strips are cut from the wafer. The invention also includes a method for flattening the strips and applying a backing to the strips enabling easier manipulation of the strips during assembly and use.
申请公布号 US2014151580(A1) 申请公布日期 2014.06.05
申请号 US201314082676 申请日期 2013.11.18
申请人 KLA-Tencor Corporation 发明人 Wang Daimian;Chilese Frank
分类号 G02B27/09 主分类号 G02B27/09
代理机构 代理人
主权项 1. A EUV light homogenizer for a EUV reticle inspection system comprising: a hollow four sided tunnel, wherein said four sided tunnel include four flat strips, each of said four flat strips having an inner surface and an outer surface; wherein each of said inner surfaces is coated with a high reflectivity coating; and, wherein said four strips are joined to form said four-sided tunnel.
地址 Milpitas CA US