发明名称 |
METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER |
摘要 |
The present invention is a light homogenizer or light tunnel with highly reflective sides that enable the focusing of EUV illumination. The sides of the homogenizer are cut from a highly polished silicon wafer. The wafer is coated with a reflective coating before the strips are cut from the wafer. The invention also includes a method for flattening the strips and applying a backing to the strips enabling easier manipulation of the strips during assembly and use. |
申请公布号 |
US2014151580(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
US201314082676 |
申请日期 |
2013.11.18 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Wang Daimian;Chilese Frank |
分类号 |
G02B27/09 |
主分类号 |
G02B27/09 |
代理机构 |
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代理人 |
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主权项 |
1. A EUV light homogenizer for a EUV reticle inspection system comprising:
a hollow four sided tunnel, wherein said four sided tunnel include four flat strips, each of said four flat strips having an inner surface and an outer surface; wherein each of said inner surfaces is coated with a high reflectivity coating; and, wherein said four strips are joined to form said four-sided tunnel.
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地址 |
Milpitas CA US |