| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a non-photosensitive diffusion composition which is low in acidity and excellent in adaptability to a coating apparatus, while suppressing diffusion into a high-temperature atmosphere, such as a thermal diffusion furnace, and having excellent diffusion properties, in patterning a diffusion composition on a semiconductor substrate using a printing method.SOLUTION: A non-photosensitive composition contains at least one (A) selected from compounds represented by the following formulae (1)-(3) and an organic solvent (B). (In the formulae, Rrepresents an organic group, a hydroxy group or a polysiloxane residue, Rrepresents an organic group having 2 to 20 carbon atoms, inclusive, and Rrepresents an organic group having 1 to 10 carbon atoms, inclusive.)</p> |
