发明名称 |
PHOTOCATHODE ENHANCEMENT SYSTEM |
摘要 |
A photocathode enhancement system includes a cathode plate that is movably positioned relative to an incident optical beam. The emission surface of the cathode plate has an area between about 0.5 cm2 to greater than 100 cm2. The system includes a motion controller that is configured to control the movement of the cathode plate relative to the optical beam, so that the optical beam successively strikes non-overlapping portions of the emission surface, and may reach substantially the entire emission surface over a time period of about 10 seconds to about 100 seconds. The movement of the cathode plate is controlled so that on average, the heat from the optical beam is uniformly distributed over the emission surface of the cathode plate. |
申请公布号 |
US2014152175(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
US201213691708 |
申请日期 |
2012.11.30 |
申请人 |
FAR-TECH, INC |
发明人 |
CHANG Xiangyun |
分类号 |
H01J29/02 |
主分类号 |
H01J29/02 |
代理机构 |
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代理人 |
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主权项 |
1. A system comprising:
a photocathode having a cathode plate movably positioned relative to an incident optical beam, wherein the cathode plate has an emission surface of an area between about 0.5 cm2 to about 100 cm2; and a motion controller configured to control movement of the cathode plate relative to the optical beam, so that the optical beam successively strikes non-overlapping portions of the emission surface.
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地址 |
San Diego CA US |