| 发明名称 |
STRESS RELIEF STRUCTURE |
| 摘要 |
A stress relief structure is provided. The stress relief structure includes a stress relief body, at least one first stress relief base and at least one second stress relief base. The stress relief body has an upper surface and a lower surface opposite to each other. The first stress relief base is disposed on the upper surface of the stress relief body. The second stress relief base is disposed on the lower surface of the stress relief body. The at least one first stress relief base and the at least one second stress relief base are interlaced to each other. |
| 申请公布号 |
US2014151090(A1) |
申请公布日期 |
2014.06.05 |
| 申请号 |
US201313848739 |
申请日期 |
2013.03.22 |
| 申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
Chien Jui-Hung;Lung Chiao-Ling |
| 分类号 |
H05K1/02 |
主分类号 |
H05K1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A stress relief structure, comprising:
a stress relief body, having an upper surface and a lower surface opposite to each other; at least one first stress relief base, disposed on the upper surface of the stress relief body; and at least one second stress relief base, disposed on the lower surface of the stress relief body, wherein the at least one first stress relief base and the at least one second stress relief base are interlaced to each other.
|
| 地址 |
Hsinchu TW |
