发明名称 MEMS element, and manufacturing method of MEMS element
摘要 In a MEMS device having a substrate 1, a sealing membrane 7, and a movable portion 3 of beam and an electrode 5 which have a region wherein they overlap with a gap in perpendicular to a substrate 1 surface, a first cavity 9 is on the side of the movable portion 3 in the direction perpendicular to the surface of the substrate, and a second cavity is the other cavity, and an inner surface a of a side wall A in contact with the electrode 5, of the first cavity 9, is positioned more inside than an inner surface b of a side wall B in contact with the electrode 5, of the second cavity 10, in the direction parallel to the substrate surface, such that the movable portion 3 does not collide with the electrode 5 when mechanical stress is applied from outside to the sealing membrane 7.
申请公布号 US8742872(B2) 申请公布日期 2014.06.03
申请号 US201113322990 申请日期 2011.02.24
申请人 Panasonic Corporation 发明人 Iwasaki Tomohiro;Onishi Keiji;Nakamura Kunihiko
分类号 H03H9/02;H03H9/10;H03B5/30;H03H3/007;H01L21/62;H01L23/02;H03H9/24;B81B3/00;B81B7/00;B81C1/00 主分类号 H03H9/02
代理机构 代理人
主权项 1. A MEMS device comprising a substrate and a sealing membrane, wherein: a movable portion of beam structure which vibrates mechanically, and an electrode which is positioned close to the movable portion are provided between the substrate and the sealing membrane, and the movable portion and the electrode have a region where the movable portion and the electrode overlap each other with a gap in a direction perpendicular to a surface of the substrate, a first cavity and a second cavity which are separated by the electrode are formed between the substrate and the sealing membrane, the first cavity is positioned on a side of the movable portion in the direction perpendicular to the surface of the substrate when viewed from the electrode at the region where the movable portion and the electrode overlap, the second cavity is positioned on a side opposite to the movable portion in the direction perpendicular to the surface of the substrate when viewed from the electrode at the region where the movable portion and the electrode overlap, and B1/A1≧1.0 in which A1 is distance between an inner surface of a side wall A in contact with the electrode, of the first cavity, and a reference position O in the direction parallel to the surface of the substrate and perpendicular to the direction of the beam constituting the movable portion, B1 is distance between an inner surface of a side wall B in contact with the electrode, of the second cavity, and the reference position O in the direction parallel to the surface of the substrate and perpendicular to the direction of the beam constituting the movable portion, and the reference position O is a position where the electrode is maximally displaced in the direction perpendicular to the surface of the substrate at a region where the electrode and the movable portion are faced to each other perpendicular to the surface of the substrate when force is exerted to the electrode in the direction perpendicular to the surface of the substrate.
地址 Osaka JP