The present invention relates to a cleaning apparatus for a UV reactor that has an injection nozzle. The cleaning apparatus for a UV reactor can selectively remove contaminants and scale materials from a UV lamp of the UV reactor by cleaning the UV lamp of the UV reactor through the injection nozzle, and a compact design also can be obtained by reducing the volume of a CIP tank. In addition, the cleaning apparatus for a UV reactor can effectively collect cleaning solutions discharged from the UV reactor by sucking them regardless of the position of the UV reactor.
申请公布号
KR20140066882(A)
申请公布日期
2014.06.03
申请号
KR20120133537
申请日期
2012.11.23
申请人
HYUNDAI HEAVY INDUSTRIES CO., LTD.
发明人
JEONG, GIL JU;KIM, YANG GYU;JANG, WON TAEK;RHEE, TAE JIN;HAN, KI HOON;YOON, SUNG HWAN