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发明名称
基板处理方法及基板处理装置
摘要
申请公布号
TWI440089
申请公布日期
2014.06.01
申请号
TW099131172
申请日期
2010.09.15
申请人
日立国际电气股份有限公司 日本
发明人
原田彻;南政克
分类号
H01L21/31;H01L21/762
主分类号
H01L21/31
代理机构
代理人
何金涂 台北市大安区敦化南路2段77号8楼;王彦评 台北市大安区敦化南路2段77号8楼
主权项
地址
日本
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